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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Inhalt

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

Bibliografische Angaben

April 2018, 138 Seiten, NanoScience and Technology, Englisch
Springer Nature EN
978-3-319-76293-7

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Weitere Titel der Reihe: NanoScience and Technology

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